Langdao Silex, a startup founded in 2024 by alumni of Tsinghua University, showcased a prototype of its FlintNano LPP-OXXO EUV light source at the 26th China International Industry Fair. The system utilizes laser-produced plasma technology, featuring a 1,000W driving laser with a conversion efficiency exceeding 2%.
The prototype reports an EUV output of over 15W and a brightness of 100 W/(mm²·sr). According to the company, the system can operate continuously for over 100 hours with a plasma stability of 3% RMS and an EUV output power stability of 5%. Langdao claims that 90% of the prototype components are domestically sourced.
The company is also developing a high-power version, the FlintMicro-LPP, which has completed proof-of-principle validation. While the current output is insufficient for high-volume chip manufacturing, the technology could support research in photoresist development, mask inspection, and optical systems.
Industry experts note that the 15W output is measured at the plasma, whereas commercial standards typically measure power at the intermediate focus. Achieving levels suitable for high-volume production remains a long-term challenge, as the current supply chain for full-scale EUV lithography scanners is not yet established in China.
