ASML currently holds approximately 94% of the lithography scanner market. Due to the ongoing AI boom, the company has fully booked its production capacity for EUV systems, priced at $200 million each, through the end of 2027. To address this demand, ASML has begun construction of a new manufacturing facility in the Netherlands.
The company is also seeing significant interest in next-generation High-NA EUV equipment, which can cost over $400 million per unit and enables a 40% reduction in semiconductor structure size. Intel has already processed 1 million 300 mm silicon wafers using this technology, while TSMC plans to adopt it by 2030.
Memory manufacturers are also accelerating their adoption plans. Samsung Electronics and SK hynix intend to start using High-NA systems by 2028, as they require more compact chips. Micron Technology has ordered test units but has not yet finalized its mass production timeline. ASML remains the sole supplier of such equipment.
