Gigaphoton has introduced a new neon gas recycling system designed for ArF excimer lasers used in semiconductor lithography. The company claims this technology can reduce annual neon consumption by up to 470 kilolitres per unit, helping manufacturers lower material costs and decrease dependence on global supply chains.
The system achieves a 50% recovery rate for neon gas. While this figure matches the efficiency of Cymer's recovery systems from 2015, Gigaphoton previously indicated in 2017 that its own testing showed a potential recovery peak for ArF lasers exceeding 90%.
Competition in the recycling sector is growing, as Japanese firm Kanken Techno recently showcased a neon recycling system with over 90% efficiency at SemiCon Taiwan. Kanken is currently undergoing the certification process for its technology, which is compatible with major ArF laser developers.
Lithography processes account for approximately 70% of global neon consumption, primarily within DUV manufacturing. Following the 2022 disruption of Ukrainian neon supplies, major chipmakers including Samsung and SK Hynix began implementing in-fab recycling systems in 2024 to secure their production lines.
The industry is also exploring alternatives to neon-dependent DUV lithography. Technologies such as solid-state lasers and nanoimprint lithography, which could potentially reduce costs by 90%, are under development to eventually eliminate the need for noble gases in chip fabrication.
