ASML and German optics manufacturer Carl Zeiss have initiated the development of a next-generation lithography system, dubbed Hyper NA. The project is currently in its early stages, and ASML has not yet made a final decision regarding the commencement of equipment production.
The development process for this technology is estimated to span approximately a decade. The new system aims to surpass the capabilities of existing high-numerical-aperture (High-NA EUV) lithography tools by enabling the formation of significantly smaller chip features.
Hyper NA is expected to achieve a resolution improvement of more than one-third compared to current equipment. The technology could potentially support the manufacturing of structures measuring approximately 5 nm, which is essential for enhancing chip performance and energy efficiency.
To optimize development, ASML intends to integrate some existing solutions, such as the light source, into the new system. Meanwhile, Carl Zeiss is actively working on producing mirrors that meet the high precision requirements necessary for the Hyper NA platform.
